Special Section on a Future Large-Aperture Ultraviolet/Optical/Infrared Space Observatory

Performance and prospects of far ultraviolet aluminum mirrors protected by atomic layer deposition

[+] Author Affiliations
John Hennessy, Kunjithapatham Balasubramanian, April D. Jewell, Shouleh Nikzad

Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, Pasadena, California 91109, United States

Christopher S. Moore, Kevin France

University of Colorado, Center for Astrophysics and Space Astronomy, Boulder, Colorado 80309, United States

University of Colorado, Laboratory for Atmospheric and Space Physics, Boulder, Colorado 80309, United States

Manuel Quijada

NASA Goddard Space Flight Center, 8800 Greenbelt Road, Greenbelt, Maryland 20771, United States

J. Astron. Telesc. Instrum. Syst. 2(4), 041206 (Jun 07, 2016). doi:10.1117/1.JATIS.2.4.041206
History: Received February 15, 2016; Accepted May 13, 2016
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Abstract.  Metallic aluminum mirrors remain the best choice for high reflectance applications at ultraviolet wavelengths (90 to 320 nm) and maintain good performance through optical and infrared wavelengths. Transparent protective coatings are required to prevent the formation of an oxide layer, which severely degrades reflectance at wavelengths below 250 nm. We report on the development of atomic layer deposition (ALD) processes for thin protective films of aluminum fluoride that are viable for application at substrate temperatures <200°C. Reflectance measurements of aluminum films evaporated in ultrahigh vacuum conditions, and protected mirrors encapsulated with ALD AlF3 are used to evaluate the far ultraviolet (90 to 190 nm) and near ultraviolet (190 to 320 nm) performance of both the ALD material and the underlying metal. Optical modeling is used to predict the performance of optimized structures for future astronomical mirror applications.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

John Hennessy ; Kunjithapatham Balasubramanian ; Christopher S. Moore ; April D. Jewell ; Shouleh Nikzad, et al.
"Performance and prospects of far ultraviolet aluminum mirrors protected by atomic layer deposition", J. Astron. Telesc. Instrum. Syst. 2(4), 041206 (Jun 07, 2016). ; http://dx.doi.org/10.1117/1.JATIS.2.4.041206


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