Model for multi-step absorption and polymerization in 3D nanolithography

Jason E. Johnson; Paul Somers; Xianfan Xu

doi:10.1117/12.2648464

17 March 2023 Model for multi-step absorption and polymerization in 3D nanolithography

Jason E. Johnson, Paul Somers, Xianfan Xu

Proceedings Volume PC12412, Laser 3D Manufacturing X; PC124120F (2023) https://doi.org/10.1117/12.2648464
Event: SPIE LASE, 2023, San Francisco, California, United States

Abstract

As the multi-photon lithography (MPL) field continues to advance, it is necessary to improve understanding of the underlying kinetics. A comprehensive model of 3D nanolithography is developed, where both the excited state kinetics of initiation by multi-step absorption and the kinetics of the resulting polymerization are simulated. The different model parameters are studied by fitting the model to experimental results and simulating the determination of effective nonlinearity values of the MPL process. Finally, the application of this model to projection MPL is investigated.

Conference Presentation

Citation Download Citation

Jason E. Johnson, Paul Somers, and Xianfan Xu "Model for multi-step absorption and polymerization in 3D nanolithography", Proc. SPIE PC12412, Laser 3D Manufacturing X, PC124120F (17 March 2023); https://doi.org/10.1117/12.2648464

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