Two-photon induced 3D laser lithography is a widely used technique in additive manufacturing of three-dimensional micro- and nanostructures. However, efficient two-photon absorption (2PA) comes at a cost: It requires femtosecond pulsed laser sources leading to large and expensive setups. Recently, we introduced two-step absorption (2SA) as a novel alternative excitation mechanism[1]. This allows for employing low-power continuous-wave light sources like inexpensive, compact semiconductor laser diodes for excitation. Here, we present a compact setup based on 2SA drastically reduced in cost and size showing the potential in the field of 3D laser lithography.
[1] Vincent Hahn, Tobias Messer, N. Maximilian Bojanowski, Ernest Ronald Curticean, Irene Wacker, Rasmus R. Schröder, Eva Blasco, and Martin Wegener, Nat. Photon. 15, 932-938 (2021)
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