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30 April 2023 Highly selective radical etch, continuous thermal etch and thermal atomic layer etch
Andreas Fischer, Thorsten Lill, Mark Kawaguchi
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Proceedings Volume PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; PC124990D (2023) https://doi.org/10.1117/12.2658122
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
This conference presentation was prepared for the Advanced Etch Technology and Process Integration for Nanopatterning XII conference at SPIE Advanced Lithography + Patterning 2023.
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Andreas Fischer, Thorsten Lill, and Mark Kawaguchi "Highly selective radical etch, continuous thermal etch and thermal atomic layer etch", Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC124990D (30 April 2023); https://doi.org/10.1117/12.2658122
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KEYWORDS
Etching
Silicon
Gallium arsenide
Logic devices
Manufacturing
Oxides
Semiconducting wafers
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