Grayscale control of local magnetic properties with direct-write laser annealing

Jeffrey A. Brock; Lauren Riddiford; Katarzyna Murawska; Aleš Hrabec; Laura Heyderman

doi:10.1117/12.3029259

4 October 2024 Grayscale control of local magnetic properties with direct-write laser annealing

Jeffrey A. Brock, Lauren Riddiford, Katarzyna Murawska, Aleš Hrabec, Laura Heyderman

Author Affiliations +

Proceedings Volume PC13119, Spintronics XVII; PC1311915 (2024) https://doi.org/10.1117/12.3029259
Event: Nanoscience + Engineering, 2024, San Diego, California, United States

Abstract

Across many research fields, engineered local variations in physical properties have yielded groundbreaking material functionalities that play a crucial role in enabling future technologies. Using lithography tools initially developed for 2.5D patterning of photoresist surfaces, we have recently shown that direct-write laser annealing can be used to create arbitrarily shaped magnetic potential energy landscapes in numerous application-relevant magnetic thin-film systems. Particularly, we have created continuous variations in the magnetic compensation temperature of ferrimagnets, the interlayer coupling strength of synthetic antiferromagnets, and the magnetic anisotropy of ferromagnets and synthetic antiferromagnets. As this direct-write approach does not require patterned resist layers or ultrahigh vacuum environments, the process is significantly streamlined compared to other techniques used to locally modify materials. We envisage that the precise control of physical properties in complex patterns enabled by direct-write laser annealing is relevant not only for applications in magnetism but also for modifying any thin film whose properties change in response to heat treatment.

Conference Presentation

Citation Download Citation

Jeffrey A. Brock, Lauren Riddiford, Katarzyna Murawska, Aleš Hrabec, and Laura Heyderman "Grayscale control of local magnetic properties with direct-write laser annealing", Proc. SPIE PC13119, Spintronics XVII, PC1311915 (4 October 2024); https://doi.org/10.1117/12.3029259

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