Masking With Matched Sets

A. H. DePuy

doi:10.1117/12.954837

20 September 1976 Masking With Matched Sets

A. H. DePuy

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954837
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

The emphasis today in wafer fabrication is to continually improve device yields. This is usually accomplished at the expense of the mask maker, who is consistently being requested to provide masks of higher and higher quality. Higher mask quality is also desired due to the long-life masks, especially when used with a proximity or projection printing system. A mask inspection and usage scheme has been developed, based on an age-old inspection technique, whereby higher device yields can be realized without paying the price of increasing mask quality.

Citation Download Citation

A. H. DePuy "Masking With Matched Sets", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954837

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