Paper
28 July 1981 Microwave Curing: Is It A Reality?
Mary Ann Hockey
Author Affiliations +
Abstract
The curing or prebaking of photoresist-coated substrates using microwave radiation has several characteristics that are useful when processing LSI circuits. Some properties of microwave energy, the process results obtained with its utilization, and the advantages for photoresist baking will be presented.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mary Ann Hockey "Microwave Curing: Is It A Reality?", Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); https://doi.org/10.1117/12.931892
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Cited by 1 scholarly publication.
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KEYWORDS
Microwave radiation

Semiconducting wafers

Optical lithography

Semiconductors

Photoresist materials

Convection

Oxides

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