Pellicle Protection Of Integrated Circuit (IC) Masks

Ron Hershel

doi:10.1117/12.931869

28 July 1981 Pellicle Protection Of Integrated Circuit (IC) Masks

Ron Hershel

Proceedings Volume 0275, Semiconductor Microlithography VI; (1981) https://doi.org/10.1117/12.931869
Event: 1981 Microlithography Conferences, 1981, San Jose, United States

Abstract

The demand for higher yields in IC fabrication, economic pressure to realize the potential of projection aligners, the requirement of defect-free reticles for water steppers, and the need to reduce mask handling on the production line have generated. considerable interest in pellicle protection. of IC masks and reticles. In this paper, the mask protection problem is examined with emphasis given to the relevant optical requirements of pellicles for various projection. systems.

Citation Download Citation

Ron Hershel "Pellicle Protection Of Integrated Circuit (IC) Masks", Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); https://doi.org/10.1117/12.931869

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