Liquid Metal Ion Sources For Lithography Some Recent Advances

P. D. Prewett; D. J. McMillan; D. K. Jefferies; G. L. R. Mair

doi:10.1117/12.935103

7 November 1983 Liquid Metal Ion Sources For Lithography Some Recent Advances

P. D. Prewett, D. J. McMillan, D. K. Jefferies, G. L. R. Mair

Proceedings Volume 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II; (1983) https://doi.org/10.1117/12.935103
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

The high brightness liquid metal ion source (LMIS) is being used for ion beam lithography. Recent technological advances include a source for reactive metals and a source of ⁷Li⁺ for light ion beam lithography seems possible. Alloy sources for microfabrication by direct doping are being studied by several groups and a gold-silicon alloy source has also been used for lithography. Fundamental understanding of the LMIS is still advancing and the emission process is now generally held to be field evaporation. Recent energy spread measurements have revealed two modes of behaviour which may be linked to hydrodynamic effects.

Citation Download Citation

P. D. Prewett, D. J. McMillan, D. K. Jefferies, and G. L. R. Mair "Liquid Metal Ion Sources For Lithography Some Recent Advances", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); https://doi.org/10.1117/12.935103

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