X-Ray Lithography Exposures Using Synchrotron Radiation

Jerome P. Silverman; Rolf P. Haelbich; Warren D. Grobman; John M. Warlaumont

doi:10.1117/12.935100

7 November 1983 X-Ray Lithography Exposures Using Synchrotron Radiation

Jerome P. Silverman, Rolf P. Haelbich, Warren D. Grobman, John M. Warlaumont

Proceedings Volume 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II; (1983) https://doi.org/10.1117/12.935100
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in operation at Brookhaven National Laboratory. The characteristics of synchrotron radiation and the reasons for using such a source are discussed. A description of the beamline and its control system is given, and results of early exposures are presented.

Citation Download Citation

Jerome P. Silverman, Rolf P. Haelbich, Warren D. Grobman, and John M. Warlaumont "X-Ray Lithography Exposures Using Synchrotron Radiation", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); https://doi.org/10.1117/12.935100

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