The kinetics of processes for laser-photochemically depositing localized thin films are discussed, both in the low-intensity regime, where photoreactions are rate limiting, and in the high-intensity regime, where mass transport is rate limiting. Comparisons are made between processes relying on gas-phase and surface-phase photochemistry. Examples are given of recent studies of photoreactions confined entirely to surface phases, and preliminary results of experiments performed in the mass-transport-limited regime are reported.
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