Negative-Working E-Beam Copolymers

Robert C. Daly; Michael J. Hanrahan; Richard W. Blevins

doi:10.1117/12.947826

18 April 1985 Negative-Working E-Beam Copolymers

Robert C. Daly, Michael J. Hanrahan, Richard W. Blevins

Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985) https://doi.org/10.1117/12.947826
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Copolymers of allyl methacrylate and propargyl methacrylate have very high speed as electron-beam and x-ray resists. They produce polymers of a structural complexity not often encountered in addition polymerization. The structural variety available in allyl methacrylate polymers gives them unusual properties, which consequently enhance their microlithographic performance.

Citation Download Citation

Robert C. Daly, Michael J. Hanrahan, and Richard W. Blevins "Negative-Working E-Beam Copolymers", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947826

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