Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Michael Green; Young Ham; Brian Dillon; Bryan Kasprowicz; Ik Boum Hur; Joong Hee Park; Yohan Choi; Jeff McMurran; Henry Kamberian; Daniel Chalom; Jan Klikovits; Michal Jurkovic; Peter Hudek

doi:10.1117/12.2247941

20 October 2016 Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, Peter Hudek

Author Affiliations +

Proceedings Volume 10032, 32nd European Mask and Lithography Conference; 1003205 (2016) https://doi.org/10.1117/12.2247941
Event: 32nd European Mask and Lithography Conference, 2016, Dresden, Germany

Abstract

As optical lithography is extended into 10nm and below nodes, advanced designs are becoming a key challenge for mask manufacturers. Techniques including advanced Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) result in structures that pose a range of issues across the mask manufacturing process. Among the new challenges are continued shrinking Sub-Resolution Assist Features (SRAFs), curvilinear SRAFs, and other complex mask geometries that are counter-intuitive relative to the desired wafer pattern. Considerable capability improvements over current mask making methods are necessary to meet the new requirements particularly regarding minimum feature resolution and pattern fidelity. Advanced processes using the IMS Multi-beam Mask Writer (MBMW) are feasible solutions to these coming challenges. In this paper, we study one such process, characterizing mask manufacturing capability of 10nm and below structures with particular focus on minimum resolution and pattern fidelity.

Citation Download Citation

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, and Peter Hudek "Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)", Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 1003205 (20 October 2016); https://doi.org/10.1117/12.2247941

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