An Optical Method For In-Line Glass Flow Control

A. Tissier; A. Poncet; G. Giroult; D. Maystre; P. Vincent

doi:10.1117/12.949347

10 March 1989 An Optical Method For In-Line Glass Flow Control

A. Tissier, A. Poncet, G. Giroult, D. Maystre, P. Vincent

Proceedings Volume 1012, In-Process Optical Measurements; (1989) https://doi.org/10.1117/12.949347
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Oxide reflow, employed in IC technology to planarize the dielectric layers, is a critical step in multilevel CMOS processes. We have studied the control of the oxide reflow profile using laser beam diffraction by a line grating printed in the oxide film. Using an experimental set-up to record the diffracted light we found that a relation exists between the line profile and the diffraction pattern. In order to obtain a better understanding we developed a theoretical description of the full phenomenon : we first modelized the glass reflow as a purely viscous flow using numerical simulations. The diffraction was then analysed using a theory based on Maxwell equations and the corresponding equations were discretized. A good fit between theory and experiment was found showing a significant and sensitive correlation between the line profile and the diffraction pattern evolutions. These results lead to a new non-destructive in-line glass flow control method.

Citation Download Citation

A. Tissier, A. Poncet, G. Giroult, D. Maystre, and P. Vincent "An Optical Method For In-Line Glass Flow Control", Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); https://doi.org/10.1117/12.949347

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