Optimization of stochastic EUV resist models parameters to mitigate line edge roughness

John J. Biafore; Azat Latypov; Anindarupa Chunder; Andy Brendler; Todd Bailey; Harry J. Levinson

doi:10.1117/12.2258707

24 March 2017 Optimization of stochastic EUV resist models parameters to mitigate line edge roughness

John J. Biafore, Azat Latypov, Anindarupa Chunder, Andy Brendler, Todd Bailey, Harry J. Levinson

Proceedings Volume 10143, Extreme Ultraviolet (EUV) Lithography VIII; 101432B (2017) https://doi.org/10.1117/12.2258707
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

The optimization problem of reducing EUV line edge roughness (LER) of a given feature, subject to the tolerance constraints on a CD of this feature at nominal EUV process conditions and several off-nominal conditions, is formulated. A stochastic rigorous Monte-Carlo EUV resist model is employed to solve this stochastic optimization problem. Several options for optimization algorithms, suitable for the solution of the formulated EUV LER optimization problem, are presented and discussed, along with the results of their tests.

Citation Download Citation

John J. Biafore, Azat Latypov, Anindarupa Chunder, Andy Brendler, Todd Bailey, and Harry J. Levinson "Optimization of stochastic EUV resist models parameters to mitigate line edge roughness", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101432B (24 March 2017); https://doi.org/10.1117/12.2258707

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