Presentation + Paper
30 March 2017 SOCS based post-layout optimization for multiple patterns with light interference prediction
Author Affiliations +
Abstract
As technology node shrinks down, hotspots, i.e. patterning failures on wafer after etching process, become an inevitable problem. The main cause of such hotspots is low contrast of aerial image. There are several methods that can improve aerial image contrast such as SRAF insertion and OPC. However, it is difficult to fix all hotspots by applying only SRAF and OPC in advanced technology node. This paper proposes a new post-layout optimization method, before SRAF and OPC, based on SOCS kernel for improving aerial image contrast and reducing hotspots. Experimental results show average 4nm PV-band improvement, as a result of contrast improvement.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Taiki Kimura, Tetsuaki Matsunawa, Shigeki Nojima, and David Z. Pan "SOCS based post-layout optimization for multiple patterns with light interference prediction", Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101480A (30 March 2017); https://doi.org/10.1117/12.2260091
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KEYWORDS
Photovoltaics

SRAF

Optical proximity correction

Image processing

Constructive interference

Lithography

Destructive interference

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