IR-drop analysis for validating power grids and standard cell architectures in sub-10nm node designs

Yongchan Ban; Chenchen Wang; Jia Zeng; Jongwook Kye

doi:10.1117/12.2258340

28 March 2017 IR-drop analysis for validating power grids and standard cell architectures in sub-10nm node designs

Yongchan Ban, Chenchen Wang, Jia Zeng, Jongwook Kye

Proceedings Volume 10148, Design-Process-Technology Co-optimization for Manufacturability XI; 1014810 (2017) https://doi.org/10.1117/12.2258340
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Since chip performance and power are highly dependent on the operating voltage, the robust power distribution network (PDN) is of utmost importance in designs to provide with the reliable voltage without voltage (IR)-drop. However, rapid increase of parasitic resistance and capacitance (RC) in interconnects makes IR-drop much worse with technology scaling. This paper shows various IR-drop analyses in sub 10nm designs. The major objectives are to validate standard cell architectures, where different sizes of power/ground and metal tracks are validated, and to validate PDN architecture, where types of power hook-up approaches are evaluated with IR-drop calculation. To estimate IR-drops in 10nm and below technologies, we first prepare physically routed designs given standard cell libraries, where we use open RISC RTL, synthesize the CPU, and apply placement & routing with process-design kits (PDK). Then, static and dynamic IR-drop flows are set up with commercial tools. Using the IR-drop flow, we compare standard cell architectures, and analysis impacts on performance, power, and area (PPA) with the previous technology-node designs. With this IR-drop flow, we can optimize the best PDN structure against IR-drops as well as types of standard cell library.

Citation Download Citation

Yongchan Ban, Chenchen Wang, Jia Zeng, and Jongwook Kye "IR-drop analysis for validating power grids and standard cell architectures in sub-10nm node designs", Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 1014810 (28 March 2017); https://doi.org/10.1117/12.2258340

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