Modification Of The Statistical Microroughness Of Surfaces By Thin Film Deposition: A Model

Heinz-Gunter Walther; Angela Duparre

doi:10.1117/12.949454

11 April 1989 Modification Of The Statistical Microroughness Of Surfaces By Thin Film Deposition: A Model

Heinz-Gunter Walther, Angela Duparre

Author Affiliations +

Proceedings Volume 1015, Micromachining Optical Components and Precision Engineering; (1989) https://doi.org/10.1117/12.949454
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

A model describing the modification of a surface roughness profile due to thin film deposition is presented. Surface smoothing as well as roughening are found to be significant effects. Conclusions which can be drawn from the roughness model with respect to related light scattering make it possible to interpret film scattering experimentally observed.

Citation Download Citation

Heinz-Gunter Walther and Angela Duparre "Modification Of The Statistical Microroughness Of Surfaces By Thin Film Deposition: A Model", Proc. SPIE 1015, Micromachining Optical Components and Precision Engineering, (11 April 1989); https://doi.org/10.1117/12.949454

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE