Chemical mechanical planarization for high precision optics

Francois Batllo; Kevin Moeggenborg; Stan Lesiak; Roman Salij

doi:10.1117/12.722153

14 May 2007 Chemical mechanical planarization for high precision optics

Francois Batllo, Kevin Moeggenborg, Stan Lesiak, Roman Salij

Proceedings Volume 10316, Optifab 2007: Technical Digest; 1031609 (2007) https://doi.org/10.1117/12.722153
Event: Optifab 2007, 2007, Rochester, New York, United States

Abstract

For many years, Chemical Mechanical Planarization (CMP) has enabled the fabrication of highperformance multilevel integrated circuits for the electronics industry. While CMP techniques are now being used in the manufacturing of optical devices, the concepts and mechanisms of CMP are not yet fully understood by the optics industry. In this paper, an overview of CMP fundamentals and the potential benefits and challenges of using a CMP approach in producing optics will be presented. Examples across several applications will be discussed.

Citation Download Citation

Francois Batllo, Kevin Moeggenborg, Stan Lesiak, and Roman Salij "Chemical mechanical planarization for high precision optics", Proc. SPIE 10316, Optifab 2007: Technical Digest, 1031609 (14 May 2007); https://doi.org/10.1117/12.722153

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