Material development for high-throughput nanoimprint lithography

Kei Kobayashi; Takayuki Nakamura; Hirokazu Kato; Masayuki Hatano; Hiroshi Tokue; Tetsuro Nakasugi; Eun Hyuk Choi; Wooyung Jung; Takuya Kono

doi:10.1117/12.2297307

21 March 2018 Material development for high-throughput nanoimprint lithography

Kei Kobayashi, Takayuki Nakamura, Hirokazu Kato, Masayuki Hatano, Hiroshi Tokue, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung, Takuya Kono

Author Affiliations +

Proceedings Volume 10584, Novel Patterning Technologies 2018; 105841F (2018) https://doi.org/10.1117/12.2297307
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Nanoimprint lithography (NIL) is a candidate of alternative lithographic technology for memory devices. We are developing NIL technology and challenging critical issues such as defectivity, overlay, and throughput . NIL material is a key factor to support the robust patterning process. Especially, resist material can play an important role in addressing the issue of the total throughput performance. The aim of this research is to clarify key factors of resist property which can reduce resist filling time and template separation time . The liquid resist is filled in the relief patterns on a quartz template surface and subsequently cured under UV radiation. The filling time is a bottleneck of NILthroughput. We have clarified that the air trapping in the liquid resist is critical. Based on theoretical study, we have identified key factors of NIL-resist property. These results have provided a deeper insight into resist material for high throughput NIL.

Citation Download Citation

Kei Kobayashi, Takayuki Nakamura, Hirokazu Kato, Masayuki Hatano, Hiroshi Tokue, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung, and Takuya Kono "Material development for high-throughput nanoimprint lithography", Proc. SPIE 10584, Novel Patterning Technologies 2018, 105841F (21 March 2018); https://doi.org/10.1117/12.2297307

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available