Paper
13 March 2018 Study of μDBO overlay target size reduction for application broadening
Victor Calado, Jérôme Dépré, Clément Massacrier, Sergey Tarabrin, Richard van Haren, Florent Dettoni, Régis Bouyssou, Christophe Dezauzier
Author Affiliations +
Abstract
With these proceedings we present μ-diffraction-based overlay (μDBO) targets that are well below the currently supported minimum size of 10×10 μm2 . We have been capable of measuring overlay targets as small as 4×4 μm2 with our latest generation YieldStar system. Furthermore we find an excellent precision (TMU < 0.33 nm for 6 × 6 μm2 ) without any compromise on throughput (MAM time < 60 ms). At last a study that compares four generations of YieldStar systems show clearly that the latest generation YieldStar systems is much better capable of reading small overlay targets such that the performance of a 16 × 16 μm2 on an early generation YieldStar 2nd-gen is comparable to that of a 8 × 8 μm2 on the latest YieldStar 5th-gen. This work enables a smaller metrology footprint, more placement flexibility and in-die overlay metrology solutions.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Victor Calado, Jérôme Dépré, Clément Massacrier, Sergey Tarabrin, Richard van Haren, Florent Dettoni, Régis Bouyssou, and Christophe Dezauzier "Study of μDBO overlay target size reduction for application broadening", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058507 (13 March 2018); https://doi.org/10.1117/12.2297673
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Cited by 2 scholarly publications.
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KEYWORDS
Overlay metrology

Semiconducting wafers

Metrology

Diffraction

Diffraction gratings

Photons

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