CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 10589 > Article
Presentation + Paper
20 March 2018 Advanced process and defect characterization methodology to support process development of advanced patterning structures
Supriya Ketkar, Junhan Lee, Sen Asokamani, Winston Cho, Shailendra Mishra
Author Affiliations +
Proceedings Volume 10589, Advanced Etch Technology for Nanopatterning VII; 105890F (2018) https://doi.org/10.1117/12.2297451
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States
Abstract
This paper discusses the approach and solution adopted by GLOBALFOUNDRIES, a high volume manufacturing (HVM) foundry, for dry-etch related edge-signature surface particle defects issue facing the sub-nm node in the gate-etch sector. It is one of the highest die killers for the company in the 14-nm node. We have used different approaches to attack and rectify the edge signature surface particle defect. Several process-related & hardware changes have been successively implemented to achieve defect reduction improvement by 63%. Each systematic process and/or hardware approach has its own unique downstream issues and they have been dealt in a route-cause-effect technique to address the issue.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Supriya Ketkar, Junhan Lee, Sen Asokamani, Winston Cho, and Shailendra Mishra "Advanced process and defect characterization methodology to support process development of advanced patterning structures", Proc. SPIE 10589, Advanced Etch Technology for Nanopatterning VII, 105890F (20 March 2018); https://doi.org/10.1117/12.2297451
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 6 PAGES + PRESENTATION
DOWNLOAD PAPER SAVE TO MY LIBRARY
WATCH
PRESENTATION
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Particles
Etching
Semiconducting wafers
Fin field effect transistors
Plasma
Silicon
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top