Simulation of aspheric tolerance with polynomial fitting

Jing Li; Zhaofeng Cen; Xiaotong Li

doi:10.1117/12.2288316

10 January 2018 Simulation of aspheric tolerance with polynomial fitting

Jing Li, Zhaofeng Cen, Xiaotong Li

Proceedings Volume 10616, 2017 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 106160U (2018) https://doi.org/10.1117/12.2288316
Event: International Conference on Optical Instruments and Technology 2017, 2017, Beijing, China

Abstract

The shape of the aspheric lens changes caused by machining errors, resulting in a change in the optical transfer function, which affects the image quality. At present, there is no universally recognized tolerance criterion standard for aspheric surface. To study the influence of aspheric tolerances on the optical transfer function, the tolerances of polynomial fitting are allocated on the aspheric surface, and the imaging simulation is carried out by optical imaging software. Analysis is based on a set of aspheric imaging system. The error is generated in the range of a certain PV value, and expressed as a form of Zernike polynomial, which is added to the aspheric surface as a tolerance term. Through optical software analysis, the MTF of optical system can be obtained and used as the main evaluation index. Evaluate whether the effect of the added error on the MTF of the system meets the requirements of the current PV value. Change the PV value and repeat the operation until the acceptable maximum allowable PV value is obtained. According to the actual processing technology, consider the error of various shapes, such as M type, W type, random type error. The new method will provide a certain development for the actual free surface processing technology the reference value.

Citation Download Citation

Jing Li, Zhaofeng Cen, and Xiaotong Li "Simulation of aspheric tolerance with polynomial fitting", Proc. SPIE 10616, 2017 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 106160U (10 January 2018); https://doi.org/10.1117/12.2288316

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