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4 September 2018 Enhancement of photoinscription process in fused silica by thermal treatment (Withdrawal Notice)
Badrinath Vadakkapattu C., Madhura R. Somayaji
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Proceedings Volume 10755, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications XII; 107550X (2018) https://doi.org/10.1117/12.2322513
Event: SPIE Optical Engineering + Applications, 2018, San Diego, California, United States
Abstract
This paper, originally published on 4 September 2018, was withdrawn per author request.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Badrinath Vadakkapattu C. and Madhura R. Somayaji "Enhancement of photoinscription process in fused silica by thermal treatment (Withdrawal Notice)", Proc. SPIE 10755, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications XII, 107550X (4 September 2018); https://doi.org/10.1117/12.2322513
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KEYWORDS
Glasses
Waveguides
Silica
Annealing
Refractive index
Photonics
Plasma
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