Thin film thickness measurement based on laser heterodyne interferometry

Kai Shi; Junhong Su

doi:10.1117/12.2506460

18 January 2019 Thin film thickness measurement based on laser heterodyne interferometry

Kai Shi, Junhong Su

Proceedings Volume 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment; 1083919 (2019) https://doi.org/10.1117/12.2506460
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

For the difficulty of measuring thin film thickness, a method of thin film thickness measurement based on laser heterodyne interferometry is proposed. Thin film difference of this method is generated by the relative optical path difference of Michelson interference light path with principle of heterodyne interference. The thickness is got by precision displacement table in line-by-line scaning. The shift of measurement system is about 8nm with constant temperature. Average deviation of measuring results is about 5nm. The comparison with ellipsometer shows the correctness of the method.

Citation Download Citation

Kai Shi and Junhong Su "Thin film thickness measurement based on laser heterodyne interferometry", Proc. SPIE 10839, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 1083919 (18 January 2019); https://doi.org/10.1117/12.2506460

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