Characterization Of Structure In Thin Polymer Resist Films

L. L. Kosbar; S. W. J. Kuan; C. W. Frank; R. F. W. Pease

doi:10.1117/12.953059

30 January 1989 Characterization Of Structure In Thin Polymer Resist Films

L. L. Kosbar, S. W. J. Kuan, C. W. Frank, R. F. W. Pease

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953059
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

We are investigating the structure and homogeneity of thin, multi-component resists prepared by spin casting and Langmuir Blodgett film formation technologies. Fluorescence spectroscopy has been used to evaluate various casting solvents for spin casting of multi-component films. Films of novolac containing pyrene as a small molecule probe were cast from various ethers and ether alcohols. The small molecules aggregated less when the dipole moment of the solvent closely matched that of the polymer. Langmuir-Blodgett techniques were used to create very thin (40 nm) films of novolac/diazoquinone. Images down to 1 jim were developed in these films and transferred into 50 nm of chrome. These very thin resist films could have various applications in advanced resist technologies, including mask making and deep UV lithography.

Citation Download Citation

L. L. Kosbar, S. W. J. Kuan, C. W. Frank, and R. F. W. Pease "Characterization Of Structure In Thin Polymer Resist Films", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953059

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