ANKAN : Simulator for Resist Exposure and Etching

Shri N. Gupta; R. Mehrotra; N. N. Kundu; B. P. Mathur

doi:10.1117/12.953165

25 July 1989 ANKAN : Simulator for Resist Exposure and Etching

Shri N. Gupta, R. Mehrotra, N. N. Kundu, B. P. Mathur

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953165
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

In this paper, we report the results of ANKAN, a computer program written for the exposure and development of positive photoresist using matrix formulation. Exposure process is modelled using diffraction limited optics and partially coherent light source with a wavelength λ. The program uses string model for resist development. The results of theoretical computations are reported and are found to be in good agreement with those of previous workers. In addition, the program can also be used for computing edge threshold for linewidth measurement and predicting the shape of aerial image for two dimensional objects.

Citation Download Citation

Shri N. Gupta, R. Mehrotra, N. N. Kundu, and B. P. Mathur "ANKAN : Simulator for Resist Exposure and Etching", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953165

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