Paper
4 March 2019 VIS Fabry-Pérot Interferometer with structured (TiO2/PE-SiO2)3 Bragg-reflectors on 5mm large LP-Si3N4 membranes
Christian Helke, Karla Hiller, Jan Seiler, Thomas Werner, Marco Meinig, Steffen Kurth, Thomas Otto
Author Affiliations +
Proceedings Volume 10931, MOEMS and Miniaturized Systems XVIII; 109310Q (2019) https://doi.org/10.1117/12.2509170
Event: SPIE OPTO, 2019, San Francisco, California, United States
Abstract
Miniaturized spectrometry systems are achievable e.g. by the use of MEMS based tunable Fabry-Pérot Interferometers (FPI) as wavelength selective filter elements. Main part of a FPI is the reflector which is usually realized as a stack of alternating dielectric layers with high and low refractive index. To achieve high reflectance layer stacks with larger number of layers and/or layers with a higher refractive index contrast are needed. Both have to be integrated within the manufacturing processes chain which in practice proves to be a difficult process.

We present a FPI with a (TiO2/SiO2)3 reflector stack with a reflectance of 97 % and TiO2 as high refractive index layer for the use in the VIS-range of 555 nm to 585 nm. Main achievements of TiO2 instead of Si3N4 are a higher reflectance and a minimized reflector complexity. Furthermore, we introduce a dry etch process which is compatible and integrated in the manufacturing process chain of the MEMS FPI.

Manufacturing of the 7.5 mm x 7.5 mm chip size FPI is done on 6" wafers consisting of a moveable reflector on a 210 nm thin and 5 mm in diameter LP-Si3N4 membrane and a fixed reflector with an aperture of 2 mm in diameter. The measured peak transmittance is between 28 % and 37 % with a FWHM bandwidth between 1.5 nm and 1.8 nm. It could be shown that the FPIs are tunable over the spectral range from 555 nm to 585 nm with a maximum control voltage of 45 V using the 18th interference order.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christian Helke, Karla Hiller, Jan Seiler, Thomas Werner, Marco Meinig, Steffen Kurth, and Thomas Otto "VIS Fabry-Pérot Interferometer with structured (TiO2/PE-SiO2)3 Bragg-reflectors on 5mm large LP-Si3N4 membranes", Proc. SPIE 10931, MOEMS and Miniaturized Systems XVIII, 109310Q (4 March 2019); https://doi.org/10.1117/12.2509170
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KEYWORDS
Reflectors

Semiconducting wafers

Silicon

Etching

Reflectivity

Refractive index

Transmittance

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