CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 10958 > Article
Open Access Paper
2 December 2019 MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)
Christof Klein, Hans Loeschner, Elmar Platzgummer
Author Affiliations +
Proceedings Volume 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019; 109580K (2019) https://doi.org/10.1117/12.2516033
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States
Abstract
Publisher’s Note: This video, originally published on 16 August 2019, was withdrawn per author request.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Christof Klein, Hans Loeschner, and Elmar Platzgummer "MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)", Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580K (2 December 2019); https://doi.org/10.1117/12.2516033
PROCEEDINGS
 1 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks
Microopto electromechanical systems
Optical lithography
Semiconductors
Video
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top