Productivity improvement by module life extension with software approach using Availability MAXimization (AMAX) functionality

Futoshi Sato; Sophia Hu; Toshihiro Oga; Taku Yamazaki

doi:10.1117/12.2515589

13 February 2020 Productivity improvement by module life extension with software approach using Availability MAXimization (AMAX) functionality

Futoshi Sato, Sophia Hu, Toshihiro Oga, Taku Yamazaki

Author Affiliations +

Proceedings Volume 10961, Optical Microlithography XXXII; 109610W (2020) https://doi.org/10.1117/12.2515589
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

In recent years, applications of semiconductor demands have been steadily growing, including automobiles to finance, medicine, agriculture, etc., and the needs for productivity improvement amongst semiconductor manufacturers is higher than ever. To resolve this situation, in the last few years, Gigaphoton developed emerging technologies on light source, to extend the module replacement interval and reduce the maintenance time by state-of-the-art technology into cutting edge lithography operation. In order to access highly effective and utilize productivity, it is required quantitative and predictive approach before service event execution, Gigaphoton also developed a software function named as Availability MAXimization (here after “AMAX”). Currently in light sources, PM (Periodical Maintenance, here after “PM”) schedule bases per chipmaker input concerning wafer production, which is schedule bases PM execution. Gigaphoton allows providing the solutions with chipmakers best scenario in terms of both schedule bases and availability maximization. Simultaneously therefore, chipmaker should gain the efficiency of productivity enhancement through Gigaphoton AMAX solution, as well as module lifetime extension.

Citation Download Citation

Futoshi Sato, Sophia Hu, Toshihiro Oga, and Taku Yamazaki "Productivity improvement by module life extension with software approach using Availability MAXimization (AMAX) functionality", Proc. SPIE 10961, Optical Microlithography XXXII, 109610W (13 February 2020); https://doi.org/10.1117/12.2515589

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