Design for manufacturability for analog, radio frequency, and millimeter wave designs

Lynn Wang; Gail Katzman; Yongfu Li; Vikas Mehrotra; Janam Bakshi; Ahmed Abdulghany; Michael Simcoe; Rais Huda; Zhao Chuan Lee; Don Blackwell; Thomas Hermann; Uwe Paul Schroeder; Thomas McKay; Sriram Madhavan

doi:10.1117/12.2514769

20 March 2019 Design for manufacturability for analog, radio frequency, and millimeter wave designs

Lynn Wang, Gail Katzman, Yongfu Li, Vikas Mehrotra, Janam Bakshi, Ahmed Abdulghany, Michael Simcoe, Rais Huda, Zhao Chuan Lee, Don Blackwell, Thomas Hermann, Uwe Paul Schroeder, Thomas McKay, Sriram Madhavan

Author Affiliations +

Proceedings Volume 10962, Design-Process-Technology Co-optimization for Manufacturability XIII; 109620G (2019) https://doi.org/10.1117/12.2514769
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

A suite of DFM enablement is enhanced to address the unique needs of analog, RF, and mmWave designs in the custom design flow. The DFM rules and patterns are made stricter beyond baseline requirements, and new DFM rules and patterns are added to further reduce layout-dependent device variability. Auto-fixing in the custom design flow is enhanced to meet these new requirements. New DFM enablement is developed for device matching for differential circuits and sensitive devices. Lastly, novel DFM fill strategies are implemented to reduce the variability of passive devices operating at high frequencies. Using DFM-aware fill, a 2% quality-factor loss for a mmWave inductor operating at 30 GHz is shown to be sufficient for meeting manufacturing planarity requirements.

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Lynn Wang, Gail Katzman, Yongfu Li, Vikas Mehrotra, Janam Bakshi, Ahmed Abdulghany, Michael Simcoe, Rais Huda, Zhao Chuan Lee, Don Blackwell, Thomas Hermann, Uwe Paul Schroeder, Thomas McKay, and Sriram Madhavan "Design for manufacturability for analog, radio frequency, and millimeter wave designs", Proc. SPIE 10962, Design-Process-Technology Co-optimization for Manufacturability XIII, 109620G (20 March 2019); https://doi.org/10.1117/12.2514769

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