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3 September 2019 Tunable optical properties of uniform and nanostructured TiN thin films
Yi-Jun Jen, Meng-Jie Lin, Ming-Zheng Li, Ming-Yang Cong
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Proceedings Volume 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI; 110892S (2019) https://doi.org/10.1117/12.2535680
Event: SPIE Nanoscience + Engineering, 2019, San Diego, California, United States
Abstract
In this work, TiN uniform thin films and nanostructured thin films were fabricated in a magnetron sputtering system. Two sets of TiN thin films with and without substrate bias were deposited at a nitrogen flow rate varied from 1.2 sccm to 2.0 sccm. The permittivity spectra of TiN films were measured and compared between different deposition conditions. A glancing angle-deposited TiN nanorod array was deposited with substrate bias. The polarization dependent extinction versus wavelength and angle of incidence was measured to discuss the associated transverse and longitudinal plasmonic modes.
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Yi-Jun Jen, Meng-Jie Lin, Ming-Zheng Li, and Ming-Yang Cong "Tunable optical properties of uniform and nanostructured TiN thin films", Proc. SPIE 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI, 110892S (3 September 2019); https://doi.org/10.1117/12.2535680
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KEYWORDS
Tin
Thin films
Plasmonics
Sputter deposition
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