Using epoxy-based lithography to probe confinement effects on active nematics

Dimitrius A. Khaladj; Amanda J. Tan; Linda S. Hirst

doi:10.1117/12.2528602

29 August 2019 Using epoxy-based lithography to probe confinement effects on active nematics

Dimitrius A. Khaladj, Amanda J. Tan, Linda S. Hirst

Proceedings Volume 11092, Liquid Crystals XXIII; 110920F (2019) https://doi.org/10.1117/12.2528602
Event: SPIE Organic Photonics + Electronics, 2019, San Diego, California, United States

Abstract

Active nematics are out-of-equilibrium liquid crystal fluids composed of rod-like subunits, which can generate large-scale, self-driven flows. In this emerging field of active nematics, new methods are needed to investigate and potentially control phase structure and dynamics. The use of complex engineered surfaces using microfabrication is an excellent way to control local orientation directors, taking advantage of the interplay between surface curvatures and topological defects. Epoxy-based lithography represents a simple and appealing approach, using low cost, minimal materials and a time efficient process. In this manuscript, we discuss methods for optimized fabrication protocols using negative and positive tone epoxy-based photoresists to create microfluidic devices for active matter. Arrays of curved objects and submerged topographies can be used to generate a variety of liquid crystal defect configurations not typically observed on unconfined planar surfaces.

Citation Download Citation

Dimitrius A. Khaladj, Amanda J. Tan, and Linda S. Hirst "Using epoxy-based lithography to probe confinement effects on active nematics", Proc. SPIE 11092, Liquid Crystals XXIII, 110920F (29 August 2019); https://doi.org/10.1117/12.2528602

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