Application of femtosecond frequency combs in the measurement of film thickness

A. Ainijiang; A. Abuduresuli

doi:10.1117/12.2532673

17 May 2019 Application of femtosecond frequency combs in the measurement of film thickness

A. Ainijiang, A. Abuduresuli

Proceedings Volume 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019); 111700Z (2019) https://doi.org/10.1117/12.2532673
Event: Fourteenth National Conference on Laser Technology and Optoelectronics, 2019, Shanghai, China

Abstract

In this paper, a method to measure the thickness of TiO₂ is developed based on the Micklson interferometer. Through a spectral domain analysis of multiple interferograms obtained using a femtosecond pulse laser, accroding to the interferance signals appear in the interferograms the thickness of film can be measured at high speed. we developed a simple method to measure the film thickness and for a sample we use the silicon wafer and coated TiO₂ silicon wafer. Thickness of silicon wafer and coated TiO₂ silicon wafer were measured respectivly, then from the thickness of coated TiO₂ silicon wafer minus the thickness of silicon wafer. Result shows that the avarege thickness of TiO2 is 75.00μm.

Citation Download Citation

A. Ainijiang and A. Abuduresuli "Application of femtosecond frequency combs in the measurement of film thickness", Proc. SPIE 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019), 111700Z (17 May 2019); https://doi.org/10.1117/12.2532673

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