Paper
17 May 2019 Enhanced circular dichroism by all-dielectric multi-size combined chiral structure
Author Affiliations +
Proceedings Volume 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019); 1117016 (2019) https://doi.org/10.1117/12.2532721
Event: Fourteenth National Conference on Laser Technology and Optoelectronics, 2019, Shanghai, China
Abstract
We propose and present a high-efficiency circular dichroism device formed by an array of multi-size chiral slits etched in a silicon layer that is on a silicon dioxide substrate. Numerical results show that the all-dielectric chiral metasurface exhibits a high circular dichroism in the range of 1500-1550 nm. At the resonance wavelength of 1540 nm, the highest circular dichroism (CD = TRCP-TLCP) reaches 97%, and the extinction ratio (ER = TRCP/TLCP) is up to 1999:1. It is also found that multiple wavebands operation can be implemented by manipulating the relative positions of multi-size slits in the structure. The proposed 2D all-dielectric chiral metasurface has the advantages of high circular dichroism, easy-fabrication and high compatibility with linear polarized components, which provides a solution for pixelated full-Stokes polarization imaging.
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Cun He, Jingpei Hu, Ti Sun, Junjie Guo, Jie Xia, Meng Cao, and Chinhua Wang "Enhanced circular dichroism by all-dielectric multi-size combined chiral structure", Proc. SPIE 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019), 1117016 (17 May 2019); https://doi.org/10.1117/12.2532721
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KEYWORDS
Dichroic materials

Silicon

Waveguides

Polarization

Refractive index

Solids

Semiconductors

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