Preparation of reflection-type MoS2 saturable absorber and application in 2μm waveband

Liang-Fang You; Rui Sun; Chen Chen; Ke Li; Wei-Jun Ling; Zhong Dong; Qiang Xu; Ya-Ni Zhang

doi:10.1117/12.2533458

17 May 2019 Preparation of reflection-type MoS₂ saturable absorber and application in 2μm waveband

Liang-Fang You, Rui Sun, Chen Chen, Ke Li, Wei-Jun Ling, Zhong Dong, Qiang Xu, Ya-Ni Zhang

Proceedings Volume 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019); 111701N (2019) https://doi.org/10.1117/12.2533458
Event: Fourteenth National Conference on Laser Technology and Optoelectronics, 2019, Shanghai, China

Abstract

The reflection-type MoS2 saturable absorber was prepared by the spin coating method. The silver plated reflector was made by plating the sliver reflective film on a Hydrophilic treated quartz sheet. The Tm,Ho:LiLuF4 all solid-state laser with MoS2 reflective saturable absorber is realized in Q-switched mode-locking operation. The laser maximum output power is 156 mW, typical Q-switched pulse envelope repetition frequency is 10KHz and the pulse width about 200μs. The repetition frequency of the mode-locked pulse sequence is 100 MHz and the modulation depth is close to 100%. The results show that the reflective MoS2 material can be used as a saturable absorber for all solid-state lasers in 2μm band.

Citation Download Citation

Liang-Fang You, Rui Sun, Chen Chen, Ke Li, Wei-Jun Ling, Zhong Dong, Qiang Xu, and Ya-Ni Zhang "Preparation of reflection-type MoS₂ saturable absorber and application in 2μm waveband", Proc. SPIE 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019), 111701N (17 May 2019); https://doi.org/10.1117/12.2533458

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