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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in 35th European Mask and Lithography Conference (EMLC 2019), edited by Uwe F.J. Behringer, Jo Finders, Proceedings of SPIE Vol. 11177 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510630673 ISBN: 9781510630680 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445 Copyright © 2019, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $21.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/19/$21.00. Printed in the United States of America by Curran Associates, Inc., under license from SPIE. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Bilski, Bartosz, 0I Bork, Ingo, 07 Bottiglieri, Gerardo, 0I, 0V Brackmann, Varvara, 13 Broman, P., 0Z Browning, Clyde, 13 Buck, Peter, 07 Bürgel, Christian, 09 Canga, Eren, 0J Charley, Anne-Laure, 14 Chaudhary, Narendra, 0S Cho, Sang Jin, 11 Choi, Heon Kyu, 11 Chou, Kevin, 0D Cohen, Avi, 0J, 12 Custers, Rolf, 0U de Graaf, D., 0Z Devaraj, Lokesh, 0V Dmitriev, Vladimir, 0J Ebert, Martin, 0D Ekinci, Yasin, 0U Erdmann, Andreas, 0V Finders, Jo, 0Y Fliervoet, Timon, 0V Friedrich, Michael, 13 Fukui, Toru, 05 Gallagher, Emily, 0A Gorhad, Kujan, 0J Gräupner, P., 0B Hanisch, Norbert, 13 Hashimoto, Masahiro, 05 Haslinger, Michael J., 0K Hendrickx, Eric, 0A Hiromatsu, Takahiro, 05 Hoefnagels, Rik, 0U Hu, Xuerang, 0D Indykiewicz, Kornelia, 15 Jätzlau, S., 0F Ji, Xiaoyu, 0D Jonckheere, Rik, 0A Jongbloed, Bert, 14 Kaiser, W., 0B Kim, Ji Hyang, 11 Kim, Ji Kang, 11 Kim, Ryoung Han, 0A Kim, Sung Wan, 11 Knoblauch, Nils, 0Q Kulse, P., 0F Kupers, Michiel, 0V, 0Z Kürz, P., 0B Lee, Byung Pil, 11 Lee, Gil Su, 11 Leray, Philippe, 0J, 14 Levinson, Harry J., 02 Liddle, Jack, 0I Liu, Xuedong, 0D Luo, Xinan, 0D Ma, Eric, 0D Maeda, Hitoshi, 05 Mochi, Iacopo, 0U Moharana, Amiya R., 0K Mori, Takahiro, xv Mühlberger, Michael, 0K Ohkubo, Ryo, 05 Ono, Kazunori, 05 Ortloff, Dirk, 0Q Otten, Ronald, 14 Paszkiewicz, Bartłomiej, 15 Paszkiewicz, Regina, 15 Philipsen, Vicky, 0A Piliego, C., 0Z Ren, Weiming, 0D Ricken, K., 0Z Rispens, Gijsbert, 0U Roesch, Matthias, 0I Romanets, O., 0Z Ronse, Kurt, 0A Savari, Serap A., 0S Schulz, K., 0F Sczyrba, Martin, 09 Seltmann, Rolf, 12 Sharoni, Ofir, 12 Shishido, Hiroaki, 05 Song, Won Kyeong, 11 Stoeldraijer, J., 0B Stokhof, Maarten, 14 Sufrin, Yael, 0J, 12 Timmermans, Frank J., 0Y Tseng, Li-Ting, 0U Uhlig, Benjamin, 13 Utzny, Clemens, 09 van Dijk, Leon, 14 Van Elshocht, Sven, 14 van Haren, Richard, 14 van Lare, Claire, 0Y van Lent-Protasova, Lidia, 0U Van Look, Lieve, 0A van Schoot, Jan, 0B, 0I van Setten, Eelco, 0I, 0V Vockenhuber, Michaela, 0U Wählisch, Felix, 0V, 0Z Wang, Xiaolong, 0U Wietstruck, M., 0F Xi, Qingpo, 0D Yamazaki, Akira, xv Zahlten, C., 0B Zawadzka, Agnieszka, 15 Zimmermann, Jörg, 0I Conference CommitteeConference Chairs Conference Co-chairs
Program Chairs
Program Co-chairs Program Committee
Session Chairs
ForewordOn behalf of the VDE/VDI/-GMM organisation, the EMLC2019 sponsors, and the EMLC2019 organizing committee, we welcome you to the proceedings from the 35th European Mask and Lithography Conference, EMLC2019, at the Hilton Hotel in Dresden, Germany. The conference has annually brought together scientists, researchers, engineers, and technologists from research institutes and companies from around the world to present innovations at the forefront of mask lithography and mask technology. This year, we were proud to present the following at the EMLC2019: three tutorials + welcome speaker + three keynotes + 15 invited talks + 14 oral talks + 12 posters, as well as 48 conference presentations. Tutorials
The EMLC2019 conference was dedicated to research, technology, and related processes. It provided an overview of the current state of mask and lithography technologies and future strategy. Mask manufacturers and users had the opportunity to familiarize themselves with the latest developments and results. As welcome speaker, Robert Franke, Director Office of Economic Development, City of Dresden, presented: “Smart City Dresden: Bringing Future Technologies on the Road.” The first keynote speaker was Udo Bischof from Robert Bosch GmbH (Germany). His talk was titled, “Future Trends and Drivers for Sensor Technologies”. The second keynote speaker was Naoya Hayashi of Dai Nippon Printing (Japan). His presentation was on “Electron Multi-Beam Writing of Leading-Edge Masks and NIL Master Templates.” The third keynote speaker was Harry J. Levinson from HJL Lithography, LLC (United States). Harry reported on “The Potential of EUV Lithography.” Technical ExhibitionParallel to the conference presentations, a technical exhibition took place on Tuesday and Wednesday where mask and device manufacturers presented their companies and their products. |
