Statistical local CD uniformity with novel SEM noise reduction method

Shinji Kobayashi

doi:10.1117/12.2551821

20 March 2020 Statistical local CD uniformity with novel SEM noise reduction method

Shinji Kobayashi

Proceedings Volume 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV; 1132520 (2020) https://doi.org/10.1117/12.2551821
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

This paper reports line width roughness (LWR) measurement with edge averaging method (EAM) for different measurement length (L). The issues of LWR measurement are that raw LWR measurement data contains non-negligible image noise components and depends on L. EAM is an analysis method that creates several artificial images from 4D information (x axis, y axis, pixel color and frames) of scanning electron microscopy (SEM) and detects pattern’s edges. EAM is needed only 4 one-frame’s images. Power spectral density (PSD), auto-correlation function (ACF) and height-height correlation function (HHCF) using EAM edge data were studied. As the second topic, the relationship among CD variation, LWR and PSD curves are described. The balance of CD variation and LWR depends on L. For example, when L is shortened, LWR at low frequency component changes to CD variation. To clarify L is important to compare various LWR measurement results. Therefore, we propose “𝐿𝑊𝑅^x_r ” (x is “Biased”, “Unbiased” or “Noise”) to express LWR.

Conference Presentation

Citation Download Citation

Shinji Kobayashi "Statistical local CD uniformity with novel SEM noise reduction method", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 1132520 (20 March 2020); https://doi.org/10.1117/12.2551821

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