Paper
6 December 2019 Novel synthesis and design methods of optical thin film structures using vanadium dioxide phase change material
Author Affiliations +
Proceedings Volume 11371, International Workshop on Thin Films for Electronics, Electro-Optics, Energy, and Sensors 2019; 1137109 (2019) https://doi.org/10.1117/12.2535617
Event: International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors, 2019, Reykjavik, Iceland
Abstract
Recent developments in phase change materials have led to a new generation of electronic and photonic memory devices and thermally tunable devices. Vanadium dioxide (VO2) and Germanium Antimoy Telluride (GST) are two of the most developed phase change materials. The focus of this work is on vanadium dioxide. Current methods of growing vanadium dioxide rely on reactive physical vapor deposition on heated and lattice-matched substrates. This is often a difficult deposition process with a very narrow process window. The high process tem- peratures, patterning and etching challenges, and the lattice-matching requirement severely limit the number of materials VO2 can co-exist with. As a result, compared to other types of inorganic optical thin film materials, the development of practical devices exploiting VO2 has been modest. In this paper, novel and simplified approaches to producing VO2 thin films is discussed, especially in regards to creating multilayer optical structures, tunable optical filters, switchable wiregrid polarizers, and tunable Bragg reflectors. The growth and characterization of nanostructured VO2 films are also discussed.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew M. Sarangan "Novel synthesis and design methods of optical thin film structures using vanadium dioxide phase change material", Proc. SPIE 11371, International Workshop on Thin Films for Electronics, Electro-Optics, Energy, and Sensors 2019, 1137109 (6 December 2019); https://doi.org/10.1117/12.2535617
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KEYWORDS
Vanadium

Sapphire

Thin films

Reflectivity

Thermal oxidation

Refractive index

Optical design

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