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Hybrid plasmonic substrates fabricated by a gap-controlled, template-assisted self assembly of plasmonic nanorods (NRs) inside plasmonic nanolines fabricated using large area lithography are presented. This fabrication process can potentially be employed for wafer scale fabrication of plasmonic substrates with sub-5 nm gaps. The electromagnetic hotspots arising due to these sub-5 nm gaps can be employed for sensing using surface enhanced Raman scattering (SERS). The gaps and the overall configurations of the hybrid substrate are dependent on a combination of several parameters such as the nanoline gaps and the size of the NRs assembled. These plasmonic substrates offer high electromagnetic enhancements along with the possibility of tuning the plasmon resonance wavelength in the near-IR region of the spectrum.
Y. Sharma andV. Prashar
"Hybrid plasmonic substrates fabricated by a nanoline-gap-modulated assembly of nanoparticles", Proc. SPIE 11467, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII, 114671K (21 August 2020); https://doi.org/10.1117/12.2571260
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Y. Sharma, V. Prashar, "Hybrid plasmonic substrates fabricated by a nanoline-gap-modulated assembly of nanoparticles," Proc. SPIE 11467, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII, 114671K (21 August 2020); https://doi.org/10.1117/12.2571260