Development of high precision mirrors using algorithm-based stitching interferometry and profile coating technique

Qiaoyu Wu; Qiushi Huang; Yingna Shi; Xudong Xu; Runze Qi; Zhong Zhang; Yumei He; Jie Wang; Zhanshan Wang

doi:10.1117/12.2567385

21 August 2020 Development of high precision mirrors using algorithm-based stitching interferometry and profile coating technique

Qiaoyu Wu, Qiushi Huang, Yingna Shi, Xudong Xu, Runze Qi, Zhong Zhang, Yumei He, Jie Wang, Zhanshan Wang

Author Affiliations +

Proceedings Volume 11492, Advances in Metrology for X-Ray and EUV Optics IX; 114920C (2020) https://doi.org/10.1117/12.2567385
Event: SPIE Optical Engineering + Applications, 2020, Online Only

Abstract

High precision metrology and deterministic fabrication are two indispensable techniques for making advanced X-ray mirrors. Among the various metrology and fabrication methods, we are currently developing stitching interferometry and profile coating/differential deposition techniques as a first step for this. For the development of curved focusing mirror, stitching interferometry method was studied. It is based on a global stitching algorithm taking into account the information in the overlapped area of several neighboring subapertures to finish the measurement. The method was tested on a spherical mirror with a radius of 100 m. A smallest repeatability error of 0.24 nm RMS over the two-dimensional surface is demonstrated. The stitched result was compared with NOM in Shanghai Synchrotron Radiation Facility to examine the absolute accuracy. Based on the stitching interferometry, a vertical focusing mirror of KB system was fabricated by using the profile coating technique. Through several iterations, an initial sphere mirror was modified into the desire elliptical mirror with a one-dimensional figure error (along the center line) of around 1.49 μrad RMS over 50 mm length compared with the designed ellipse.

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Qiaoyu Wu, Qiushi Huang, Yingna Shi, Xudong Xu, Runze Qi, Zhong Zhang, Yumei He, Jie Wang, and Zhanshan Wang "Development of high precision mirrors using algorithm-based stitching interferometry and profile coating technique", Proc. SPIE 11492, Advances in Metrology for X-Ray and EUV Optics IX, 114920C (21 August 2020); https://doi.org/10.1117/12.2567385

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