Thermal deformation of EUV mask according to mask type and pattern density

Chung-Hyun Ban; In-Hwa Kang; Beom-Jun Jeon; Won-young Choi; Hye-Keun Oh

doi:10.1117/12.2573149

20 September 2020 Thermal deformation of EUV mask according to mask type and pattern density

Chung-Hyun Ban, In-Hwa Kang, Beom-Jun Jeon, Won-young Choi, Hye-Keun Oh

Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115171C (2020) https://doi.org/10.1117/12.2573149
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Conference Poster

There is no online version at this time. The PDF is only available to people who have bought the paper or have a subscription.

Citation Download Citation

Chung-Hyun Ban, In-Hwa Kang, Beom-Jun Jeon, Won-young Choi, and Hye-Keun Oh "Thermal deformation of EUV mask according to mask type and pattern density", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115171C (20 September 2020); https://doi.org/10.1117/12.2573149

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available