Annular subaperture stitching interferometry with planar reference wavefront for measurement of spherical and aspherical surfaces

Markus Schake; Gerd Ehret

doi:10.1117/12.2574754

15 June 2020 Annular subaperture stitching interferometry with planar reference wavefront for measurement of spherical and aspherical surfaces

Markus Schake, Gerd Ehret

Author Affiliations +

Proceedings Volume 11523, Optical Technology and Measurement for Industrial Applications 2020; 115230D (2020) https://doi.org/10.1117/12.2574754
Event: SPIE Technologies and Applications of Structured Light, 2020, Yokohama, Japan

Abstract

An interferometric line sensor in a Michelson configuration without a transmission sphere is employed for annular subaperture stitching interferometry to measure spherical and aspherical surfaces. The misalignments between the subapertures, which are caused by positioning error induced wavefront aberrations, are corrected employing a machine learning based Zernike polynomial fitting in the overlapping regions.

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Markus Schake and Gerd Ehret "Annular subaperture stitching interferometry with planar reference wavefront for measurement of spherical and aspherical surfaces", Proc. SPIE 11523, Optical Technology and Measurement for Industrial Applications 2020, 115230D (15 June 2020); https://doi.org/10.1117/12.2574754

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