Shift-free fixed-line laser protection filter technology

James N. Monks; Jonathan Williams; Andrew Hurst; Zengbo Wang

doi:10.1117/12.2573993

20 September 2020 Shift-free fixed-line laser protection filter technology

James N. Monks, Jonathan Williams, Andrew Hurst, Zengbo Wang

Author Affiliations +

Proceedings Volume 11539, Technologies for Optical Countermeasures XVII; and High-Power Lasers: Technology and Systems, Platforms, Effects IV; 1153908 (2020) https://doi.org/10.1117/12.2573993
Event: SPIE Security + Defence, 2020, Online Only

Abstract

The development of shift-free fixed-line filters is a key technology for advancing the next generation of laser protection and is greatly desired due to the increased threat of laser attacks. Thin-film interference coatings have remained the key technology for achieving narrow bandstop filters for protection against laser light since the late 1970s. This paper presents the latest developments in fixed-line laser technology and introduces a metamaterial solution to mitigate the angular shift found in thin-film interference coatings. The metamaterial coating consists of metallic nano-particles periodically distributed within a non-absorbing dielectric material with a specific refractive index that enables the desired plasmonic resonance to exist at wavelengths that match that of the lasers. Due to the nano-particle size, the metamaterial layer can be treated as an individual homogeneous layer with properties described by an effective Drude-Lorentz approximation model. Unlike standard interference coatings where the effective index of the stack decreases with larger angles of incidence, the metamaterial’s effective index remains relatively fixed with increasing angles resulting in the narrow bandstop function remaining shift-free.

Conference Presentation

Citation Download Citation

James N. Monks, Jonathan Williams, Andrew Hurst, and Zengbo Wang "Shift-free fixed-line laser protection filter technology", Proc. SPIE 11539, Technologies for Optical Countermeasures XVII; and High-Power Lasers: Technology and Systems, Platforms, Effects IV, 1153908 (20 September 2020); https://doi.org/10.1117/12.2573993

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