Multi-field imprint technology: enabling the productivity enhancement of NIL

Tetsuro Nakasugi; Ryoichi Inanami; Kazuya Fukuhara; Motofumi Komori; Sadanori Arae; Soichi Inoue; Koji Hashimoto

doi:10.1117/12.2583385

22 February 2021 Multi-field imprint technology: enabling the productivity enhancement of NIL

Tetsuro Nakasugi, Ryoichi Inanami, Kazuya Fukuhara, Motofumi Komori, Sadanori Arae, Soichi Inoue, Koji Hashimoto

Proceedings Volume 11610, Novel Patterning Technologies 2021; 1161008 (2021) https://doi.org/10.1117/12.2583385
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

We have developed Multi-Field Imprint (MFI) technology to improve the productivity of for nano-imprint lithography (NIL). Using the template having the imprinting size of 46 mm x 28 mm for MFI and the latest NIL system NZ2C (Canon Corp.), we successfully achieved multi-field imprinting on a 300 mm wafer. The throughput being equivalent to 160 wafers per hour was demonstrated using throughput enhancement solutions, such as gas permeable spin-on-carbon and multi field dispense. The overlay accuracy around 7 nm was also obtained. In this report, we’ll report about the performance of MFI technology: patterning ability, throughput, and overlay accuracy and discuss the future outlook.

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Citation Download Citation

Tetsuro Nakasugi, Ryoichi Inanami, Kazuya Fukuhara, Motofumi Komori, Sadanori Arae, Soichi Inoue, and Koji Hashimoto "Multi-field imprint technology: enabling the productivity enhancement of NIL", Proc. SPIE 11610, Novel Patterning Technologies 2021, 1161008 (22 February 2021); https://doi.org/10.1117/12.2583385

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