Evaluating SEM-based LER metrology using a metrological tilting-AFM

Ryosuke Kizu; Ichiko Misumi; Akiko Hirai; Satoshi Gonda

doi:10.1117/12.2583475

22 February 2021 Evaluating SEM-based LER metrology using a metrological tilting-AFM

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 1161117 (2021) https://doi.org/10.1117/12.2583475
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

In this study, we developed a methodology to evaluate scanning electron microscopy (SEM)-based line edge roughness (LER) metrology. In particular, we used a metrological tilting atomic force microscopy (tilting-mAFM) as LER reference metrology. We analyzed the height-height correlation function (HHCF) of SEM line-edge profiles combining averaging and unbiased correction methods. The direct comparison of our method with tilting-mAFM enabled a precise evaluation of the SEM-based LER metrology. We demonstrated that a combination of unbiased HHCF and averaging methods with appropriate condition enabled relatively precise measurement of three roughness parameters. We observed that, for precise roughness evaluation, reducing noise in the line-edge profiles is important before performing the HHCF analysis and unbiased correction.

Conference Presentation

Citation Download Citation

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, and Satoshi Gonda "Evaluating SEM-based LER metrology using a metrological tilting-AFM", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161117 (22 February 2021); https://doi.org/10.1117/12.2583475

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