Fundamental study of polymer dynamic behavior in resist processing

Hidetami Yaegashi

doi:10.1117/12.2582275

22 February 2021 Fundamental study of polymer dynamic behavior in resist processing

Hidetami Yaegashi

Proceedings Volume 11612, Advances in Patterning Materials and Processes XXXVIII; 116120D (2021) https://doi.org/10.1117/12.2582275
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Although Extreme Ultra Violet (EUV) at 13.5 nm wavelength already moved into commercialization state, serious technical issues remain as important challenges. Local variation, such as intra-filed CD uniformity or LER, is typically identified from calculated mean CD utilizing top-down view observation. In this study, cross sectional SEM was applied efficiently and resist fundamental behaviors were visualized and quantified. Furthermore, I would mention about minimum structural unit constructing resist pattern related to resolution limit and LER.

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Citation Download Citation

Hidetami Yaegashi "Fundamental study of polymer dynamic behavior in resist processing", Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120D (22 February 2021); https://doi.org/10.1117/12.2582275

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