Poster + Presentation
5 March 2021 On resampling non-uniform scanning patterns: MEMS scanners example
Author Affiliations +
Conference Poster
Abstract
Constructing an image acquired by a non-uniform scanning pattern is a difficult task. The main challenges are:(1) resampling technique (2) discrepancy between demanded (dictated by control signal) and actually performed, empirical scanning path. Here, we show how to calibrate the scanning path of MEMS scanner using Galvanometric Scanner and to what extent the time of acquisition impacts the resulting image.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michal Meina, Szymon Tamborski, Patrycjusz Stremplewski, Krystian Wróbel, Maciej Nowakowski, Krzysztof Dalasiński, Marcin Sylwestrzak, Anna Szkulmowska, and Maciej Szkulmowski "On resampling non-uniform scanning patterns: MEMS scanners example", Proc. SPIE 11623, Ophthalmic Technologies XXXI, 116231T (5 March 2021); https://doi.org/10.1117/12.2578916
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KEYWORDS
Distortion

Microelectromechanical systems

Mirrors

Ultrafast imaging

Imaging systems

Laser scanners

Matrices

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