Fabrication of large-scale silicon nitride resonator by femtosecond laser

Zuo Feng; Yuming He; Weihua Han; Zhaofeng Li

doi:10.1117/12.2587336

2 December 2020 Fabrication of large-scale silicon nitride resonator by femtosecond laser

Zuo Feng, Yuming He, Weihua Han, Zhaofeng Li

Proceedings Volume 11717, 24th National Laser Conference & Fifteenth National Conference on Laser Technology and Optoelectronics; 117172N (2020) https://doi.org/10.1117/12.2587336
Event: 24th National Laser Conference & Fifteenth National Conference on Laser Technology and Optoelectronics, 2020, Shanghai, China

Abstract

Large-scale waveguide ring resonators are key elements in micro-optical gyroscopes. In this paper, by using the nondegenerate two-photon laser lithography technology, we fabricated a silicon nitride waveguide ring resonator on the SiO₂ substrate with a coupling distance of 600nm. The FSR of the WRR we prepared is 10GHz, the finesse of the WRR is 2.3, and the Q value is 4.5ⅹ10⁴ . The fabrication process shows the ability that femtosecond laser lithography can be processed on an insulating substrate at the nanometer scale.

Citation Download Citation

Zuo Feng, Yuming He, Weihua Han, and Zhaofeng Li "Fabrication of large-scale silicon nitride resonator by femtosecond laser", Proc. SPIE 11717, 24th National Laser Conference & Fifteenth National Conference on Laser Technology and Optoelectronics, 117172N (2 December 2020); https://doi.org/10.1117/12.2587336

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