PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Systematic investigations of thin Cr, Mo and W films deposited from the hexacarbonyls with low power, cw UV light have been carried out in order to learn about sources of contamination by C and 0 (luring film growth. Dissociative chemisorption of CO from the precursor, reactions with oxygen-containing background gases during deposition and air alter deposition all affect film compositions. Laser heating can also he important. General aspects of film contamination are discussed for other precursors such as the alkyls and acetylacetonates, and compared to the present data.
K. A. Singmaster,F. A. Houle, andR. J. Wilson
"Mechanisms Of Contamination In Photochemical Deposition Or Thin Metal Films", Proc. SPIE 1190, Laser/Optical Processing of Electronic Materials, (23 February 1990); https://doi.org/10.1117/12.963989
ACCESS THE FULL ARTICLE
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
K. A. Singmaster, F. A. Houle, R. J. Wilson, "Mechanisms Of Contamination In Photochemical Deposition Or Thin Metal Films," Proc. SPIE 1190, Laser/Optical Processing of Electronic Materials, (23 February 1990); https://doi.org/10.1117/12.963989